首页> 外国专利> PDV METHOD AND PDV DEVICE FOR PRODUCING LOW FRICTION, WEAR RESISTANT, FUNCTIONAL COATINGS, AND COATINGS PRODUCED THEREWITH

PDV METHOD AND PDV DEVICE FOR PRODUCING LOW FRICTION, WEAR RESISTANT, FUNCTIONAL COATINGS, AND COATINGS PRODUCED THEREWITH

机译:用于生产低摩擦,抗磨损,功能涂层及其生产的涂层的PDV方法和PDV设备

摘要

The invention relates to a PVD method and a PVD device for producing diamond-like (DLC) coatings with high adhesion and substrates coated according to the PVD method. The substrates which are to be coated are pretreated by means of high power impulse magnetron sputtering (HIPIMS) of tungsten carbide (WC) and subsequently provided with a transition layer of WC. Subsequently, a C-DLC or a W-DLC layer is produced by means of magnetron cathode sputtering (MS).
机译:PVD方法和PVD设备技术领域本发明涉及一种用于生产具有高粘附力的类金刚石(DLC)涂层的PVD方法和PVD设备以及根据该PVD方法涂覆的基材。借助于碳化钨(WC)的高功率脉冲磁控溅射(HIPIMS)对待涂覆的基材进行预处理,随后提供WC的过渡层。随后,借助于磁控阴极溅射(MS)产生C-DLC或W-DLC层。

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