首页> 外国专利> METHOD FOR FABRICATION OF TRANSPARENT GAS BARRIER FILM USING PLASMA SURFACE TREATMENT AND TRANSPARENT GAS BARRIER FILM FABRICATED THEREBY

METHOD FOR FABRICATION OF TRANSPARENT GAS BARRIER FILM USING PLASMA SURFACE TREATMENT AND TRANSPARENT GAS BARRIER FILM FABRICATED THEREBY

机译:等离子表面处理制造透明阻气膜的方法及其制得的透明阻气膜

摘要

The present invention relates to a method of fabricating a transparent gas barrier film by using plasma surface treatment and a transparent gas barrier film fabricated according to such method which has an organic/inorganic gradient interface structure at the interface between an organic/inorganic hybrid layer and an inorganic layer. Since the method of the present invention is capable of fabricating a gas barrier film by plasma surface treatment instead of deposition under high vacuum, it can mass-produce a transparent gas barrier film with excellent gas barrier properties in an economical and simple manner. Further, since the transparent gas barrier film fabricated according to the method of the present invention shows excellent gas barrier properties and is free of crack formation and layer-peeling phenomenon, it can be effectively used in the manufacture of a variety of display panels.
机译:本发明涉及通过使用等离子体表面处理来制造透明阻气膜的方法以及根据这种方法制造的透明阻气膜,该透明阻气膜在有机/无机杂化层与有机层之间的界面具有有机/无机梯度界面结构。无机层。由于本发明的方法能够通过等离子表面处理而不是在高真空下沉积来制造阻气膜,因此它能够以经济和简单的方式大量生产具有优异的阻气性的透明阻气膜。此外,由于根据本发明的方法制造的透明阻气膜表现出优异的阻气性并且没有裂纹形成和层剥离现象,因此可以有效地用于制造各种显示面板。

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