Illumination angle distribution and intensity distribution adjusting method for lithography projection illumination system, involves varying expansion coefficient and air-gap distance, so that difference of phase deviations is minimized

摘要

The method involves presetting a reference phase deviation of a perfect spherical wave front of utilization light, which arrives at an edge-sided mass field point (36) of an object field after passing through an illumination optics. An expansion coefficient and an air-gap distance between lenses (16-21, 24-28, 30-34) are varied such that a difference of an actual phase deviation produced by the optics at the mass field point and the preset reference phase deviation is minimized. The coefficient represents a rotation symmetric rise of an optical surface of the lenses of the optics. Independent claims are also included for the following: (1) an illumination optics for illuminating an object field of a lithography projection illumination system (2) a method for manufacturing a structured component.