Optical system for use in micro-lithographic projection exposure system, has polarization manipulator increasing maximum value of delay in light cluster for field point in comparison to appropriate optical system without manipulator

摘要

The system has a polarization manipulator (200) increasing a maximum value of delay distribution in a light cluster for a field point within a field level of the system in comparison to an appropriate optical system without the manipulator. The cluster strikes on the field point, where the value amounts to not more than 5 nanometers. The manipulator increases the delay for complete radiating of the cluster and is arranged in a plane in which a paraxial subaperture ratio amounts to 0.8. The manipulator has an optical element that is supplied with a mechanical voltage. Independent claims are also included for the following: (1) a method for manipulating reproduction characteristics of an optical system of a microlithographic projection exposure system (2) a method for microlithographic manufacturing of micro-structured elements.