Optical system for microlithographic projection exposure system, has partial sections to which distinct-polarization states are assigned, which remain obtained by sections so that light enters in sections with two input-polarization states

摘要

The system has two partial sections (110, 120) to which two distinct-polarization states (E1, E2) are respectively assigned. The polarization states remain obtained by the partial sections during passing of the light, such that the light enters in the partial sections with two input-polarization states. The input-polarization states correspond to the distinct-polarization states. A polarization manipulator (115) is attached to the partial section (110) for adjusting of the respective input-polarization states with respect to the distinct-polarization states and formed as a rotator. Independent claims are also included for the following: (1) a method for manipulating imaging characteristics of an optical system for a microlithographic projection exposure system (2) a microlithographic projection exposure system having an optical system (3) a method for a microlithographic manufacturing of microstructured components.