REFLECTIVE PHOTOMASK BLANK, REFLECTIVE PHOTOMASK, INSPECTION DEVICE FOR REFLECTIVE PHOTOMASK, AND METHOD OF INSPECTING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide: a reflective photomask blank in which the accuracy of pattern inspection on a reflective photomask is improved and the time required for the inspection can be reduced; a reflective photomask; an inspection device for a reflective photomask; and a method of inspecting the mask.;SOLUTION: The reflective photomask includes: a substrate; a reflective film reflecting exposure light emitted to the substrate; an absorber absorbing the exposure light, the absorber being formed by patterning on the reflective film; and a polarizer formed by patterning on the absorber. The inspection device includes an analyzer.;COPYRIGHT: (C)2010,JPO&INPIT