首页> 外国专利> SOLAR CELL WHOSE STRUCTURE LAYER IS (Zn, In, Al)O BASED TRANSPARENT ELECTRODE LAYER, AND ZnO-In2O3-Al BASED SPUTTERING TARGET USED FOR FORMING THE (Zn, In, Al)O BASED TRANSPARENT ELECTRODE LAYER

SOLAR CELL WHOSE STRUCTURE LAYER IS (Zn, In, Al)O BASED TRANSPARENT ELECTRODE LAYER, AND ZnO-In2O3-Al BASED SPUTTERING TARGET USED FOR FORMING THE (Zn, In, Al)O BASED TRANSPARENT ELECTRODE LAYER

机译:太阳能电池的结构层是基于(Zn,In,Al)O的透明电极层,以及基于ZnO-In2O3-Al的溅射靶材,用于形成(Zn,In,Al)O的透明电极层

摘要

PROBLEM TO BE SOLVED: To provide a solar cell whose structure layer is a (Zn, In, Al)O based transparent electrode layer having low volume resistivity and thereby contributing to the improvement of photoelectric conversion efficiency, and a ZnO-In2O3-Al based sputtering target used for forming the (Zn, In, Al)O based transparent electrode layer.;SOLUTION: Sputtering film formation of the (Zn, In)O based transparent electrode layer configuring the solar cell is executed using a ZnO-In2O3-Al based sputtering target constituted of a sintered body of a pressurized compact having a mixed composition comprising, by mass%, 0.1-10% indium oxide, 0.1-5% metal Al:, and zinc oxide as remainder (provided that inevitable impurity content: ≤0.1%).;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种太阳能电池,该太阳能电池的结构层是具有低体积电阻率的(Zn,In,Al)O基透明电极层,从而有助于提高光电转换效率;以及ZnO-In 2 O 3 -Al基溅射靶,用于形成(Zn,In,Al)O基透明电极层。;解决方案:(Zn,In)O溅射成膜使用由具有混合成分的加压成形体的烧结体构成的ZnO-In 2 O 3 -Al基溅射靶来执行构成太阳能电池的基于透明电极层的步骤。以质量%计,包括0.1-10%的氧化铟,0.1-5%的金属Al:和剩余的氧化锌(前提是不可避免的杂质含量:≤ 0.1%).;版权:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2010238894A

    专利类型

  • 公开/公告日2010-10-21

    原文格式PDF

  • 申请/专利权人 MITSUBISHI MATERIALS CORP;

    申请/专利号JP20090084915

  • 发明设计人 NAKAZAWA HIROMI;MORI RIE;

    申请日2009-03-31

  • 分类号H01L31/04;

  • 国家 JP

  • 入库时间 2022-08-21 19:05:35

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