METHOD FOR CREATING EVALUATION PATTERN, PROGRAM FOR CREATING EVALUATION PATTERN, AND PATTERN VERIFICATION METHOD

摘要

PPROBLEM TO BE SOLVED: To obtain a method for creating an evaluation pattern, by which an evaluation pattern enabling verification of sufficient stability of a pattern layout with respect to the ambient environment can be created in a short period of time. PSOLUTION: The method for creating an evaluation pattern includes creating an evaluation pattern to be laid in the periphery of a pattern to be evaluated when evaluating lithographic performance of the pattern to be evaluated, with the circuit pattern of a semiconductor circuit as the pattern to be evaluated, and the method includes: a dividing step of dividing the peripheral region of the pattern to be evaluated into a plurality of meshes; an image intensity calculation step of calculating the image intensity of the circuit pattern when a mask function value is added to a predetermined mesh and the pattern to be evaluated is transferred onto a wafer; a function value calculation step of calculating the mask function value of the mesh in such a manner that the cost function of the image intensity satisfies a predetermined measure when an optical image featured value that influences the transfer characteristics onto the wafer is set to the image intensity; and an evaluation pattern creating step of creating an evaluation pattern corresponding to the mask function value. PCOPYRIGHT: (C)2010,JPO&INPIT