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After consecutively, laminating with the two-layer where the field where formation manner of the wiring structure in

机译:依次连续层压后,在两层所在的场中布线结构的形成方式在

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a laminated structure which yields uniform layers and enables patterning with few number of processes, moreover, without conducting accurate aligning between layers.;SOLUTION: According to the method of forming the laminated structure, (A) at least a first layer 10, which is composed of a material that is turned from a conductive one into an insulating one, when exposed to energy rays, and a second layer 20 which is composed of a conductive material and leaves an area exposed to the energy rays, when exposed to the energy rays and developed, are laminated sequentially on a basic substance 1. (B) Then a laminated structure, consisting of the first and second layers 10, 20, is radiated locally with the energy rays and the second layer 20 is developed to form the first layer 10, consisting of a conductive area 10B which is not exposed to the energy rays, and an insulating area 10A which is exposed to the energy rays, and the second layer 20 consisting of an area 20A which is exposed to the energy rays.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种形成层叠结构的方法,该方法能够产生均匀的层并且能够以较少的工艺数进行图案化,并且在各层之间不进行精确对准。;解决方案:根据形成层叠结构的方法,( A)至少第一层10和第二层20,第二层20由暴露于能量射线下的材料构成,第二层20在暴露于能量射线时从导电层变成绝缘层当暴露于能量射线并显影时,将其依次层压在碱性物质1上。(B)然后,由第一和第二层10、20组成的层压结构随能量射线局部辐射,并第二层20被显影以形成第一层10,其由不暴露于能量射线的导电区域10B,和暴露于能量射线的绝缘区域10A以及第二层组成。 er 20由暴露于能量射线的区域20A组成。版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP4501444B2

    专利类型

  • 公开/公告日2010-07-14

    原文格式PDF

  • 申请/专利权人 ソニー株式会社;

    申请/专利号JP20040027574

  • 发明设计人 米屋 伸英;

    申请日2004-02-04

  • 分类号H01L21/336;H01L29/786;H01L21/28;H01L51/05;H01L51/40;H01L29/423;H01L29/49;H01L21/3205;

  • 国家 JP

  • 入库时间 2022-08-21 19:01:51

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