The simulation system or the simulation manner which uses the hybrid reaction model.

摘要

PROBLEM TO BE SOLVED: To enable simulation even if data regarding a reaction stage that material gases participates in are not available when thin-film formation by CVD is performed by using various material gases.;SOLUTION: A simulation system for a system has a vapor phase, a solid phase, and a solid-phase surface. The system includes a material gap 21 capable of forming the solid-phase surface through chemical reaction, an intermediate gas 30 constituting the substitue between the material gas 21 and a substance constituting the solid-phase surface, and a reactive gas 11 capable of reacting on the material gas 21; and causes substance migration accompanied by chemical reaction between the vapor phase and the solid-phase surface. The simulation system is equipped with an elementary reaction DB which stores known reaction data regarding elementary reaction of the reactive gas 11, and a simple model DB which stores reaction data of two to four kinds of reaction stages including the material gas 21 and intermediate gas 30. The simulation is carried out by using those DBs.;COPYRIGHT: (C)2005,JPO&NCIPI