首页> 外国专利> Channelized Gate Level Cross-Coupled Transistor Device with Complimentary Pairs of Cross-Coupled Transistors Defined by Physically Separate Gate Electrodes within Gate Electrode Level

Channelized Gate Level Cross-Coupled Transistor Device with Complimentary Pairs of Cross-Coupled Transistors Defined by Physically Separate Gate Electrodes within Gate Electrode Level

机译:具有互补对的交叉耦合晶体管对的沟道化栅极电平交叉耦合晶体管器件,该交叉耦合晶体管由栅极电极级内的物理上分开的栅极电极定义

摘要

A semiconductor device includes first and second p-type diffusion regions, and first and second n-type diffusion regions that are each electrically connected to a common node. Conductive features are each defined within any one gate level channel that is uniquely associated with and defined along one of a number of parallel gate electrode tracks. The conductive features respectively form gate electrodes of first and second PMOS transistor devices, and first and second NMOS transistor devices. The gate electrodes of the first PMOS and second NMOS transistor devices are electrically connected. However, the first PMOS and second NMOS transistor devices are physically separate within the gate electrode level region. The gate electrodes of the second PMOS and first NMOS transistor devices are electrically connected. However, the second PMOS and first NMOS transistor devices are physically separate within the gate electrode level region.
机译:半导体器件包括第一和第二p型扩散区域以及分别电连接到公共节点的第一和第二n型扩散区域。每个导电特征都定义在与多个平行栅电极轨道之一唯一关联并沿其定义的任何一个栅级沟道内。导电特征分别形成第一PMOS晶体管器件和第二PMOS晶体管器件以及第二NMOS晶体管器件的栅电极。第一PMOS晶体管器件和第二NMOS晶体管器件的栅极电连接。然而,第一PMOS和第二NMOS晶体管器件在栅电极级区域内在物理上是分开的。第二PMOS晶体管和第一NMOS晶体管器件的栅电极电连接。然而,第二PMOS晶体管器件和第一NMOS晶体管器件在栅电极级区域内物理上分开。

著录项

  • 公开/公告号US2010187632A1

    专利类型

  • 公开/公告日2010-07-29

    原文格式PDF

  • 申请/专利权人 SCOTT T. BECKER;

    申请/专利号US20100754233

  • 发明设计人 SCOTT T. BECKER;

    申请日2010-04-05

  • 分类号H01L29/78;

  • 国家 US

  • 入库时间 2022-08-21 18:53:45

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