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Method for Treatment of Samples for Auger Electronic Spectrometer (AES) in the Manufacture of Integrated Circuits

机译:集成电路制造中俄歇电子能谱仪(AES)的样品处理方法

摘要

A method for analyzing a sample for the manufacture of integrated circuits, e.g. MOS transistors, application specific integrated circuits, memory devices, microprocessors, system on a chip. The method includes providing an integrated circuit chip, which has a surface area with at least one region of interest, e.g., bond pad. The method includes covering a first portion of the surface area including the region of interest using a blocking material. The method also forms a metal layer on a second portion of the surface area, while the blocking material protects the first portion. The method removes the blocking material to expose the first portion of the surface area including the region of interest. The method also subjects the metal layer to a voltage differential to draw away one or more charged particles from the first portion of the surface area. The method also subjects the surface area including the region of interest to spectrometer analysis.
机译:一种用于分析样品以制造集成电路的方法,例如集成电路。 MOS晶体管,专用集成电路,存储设备,微处理器,片上系统。该方法包括提供集成电路芯片,该集成电路芯片的表面区域具有至少一个感兴趣的区域,例如键合焊盘。该方法包括使用阻挡材料覆盖包括感兴趣区域的表面区域的第一部分。该方法还在表面区域的第二部分上形成金属层,而阻挡材料保护第一部分。该方法去除阻挡材料以暴露包括感兴趣区域的表面区域的第一部分。该方法还使金属层经受电压差以从表面区域的第一部分抽出一个或多个带电粒子。该方法还使包括感兴趣区域的表面积经受光谱仪分析。

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