首页> 外国专利> INTEGRATED SYSTEM FOR MANUFACTURE OF SUB-MICRON 3D STRUCTURES USING 2-D PHOTON LITHOGRAPHY AND NANOIMPRINTING AND PROCESS THEREOF

INTEGRATED SYSTEM FOR MANUFACTURE OF SUB-MICRON 3D STRUCTURES USING 2-D PHOTON LITHOGRAPHY AND NANOIMPRINTING AND PROCESS THEREOF

机译:利用二维光子照相术和纳米浸渍技术制造亚微米3D结构的集成系统

摘要

ABSTRACT INTEGRATED SYSTEM FOR MANUFACTURE OF SUB-MICRON 3D STRUCTURESUSING 2-D PHOTON LITHOGRAPHYAND NANOIMPRINTING AND PROCESS THEREOFA system integrating 2-photon lithography and nanoimprinting to manufacture high-throughput and low cost sub-micron 3D structure products is proposed. A process integrating 2-photon lithography and nanoimprinting to manufacture high-throughput and low cost sub-micron 3D structure products is also proposed. The invention enables the sub-micron 3D structures to be created layer by layer. Applications include manufacture of scaffolds for tissue engineering and medical devices such as bridges for nerves and bones.Fig. 1
机译:抽象亚微米3D结构制造集成系统使用2D光子照相术以及纳米印刷及其工艺集成了2光子光刻和纳米压印的系统提出了一种通量和低成本的亚微米3D结构产品。一个过程集成了2光子光刻和纳米压印以制造高通量还提出了低成本的亚微米3D结构产品。本发明可以逐层创建亚微米3D结构。应用领域包括制造用于组织工程和医疗设备的支架,例如神经和骨骼的桥梁。图。1

著录项

  • 公开/公告号SG162633A1

    专利类型

  • 公开/公告日2010-07-29

    原文格式PDF

  • 申请/专利权人 HELIOS APPLIED SYSTEMS PTE LTD;

    申请/专利号SG20080094898

  • 发明设计人 KAN SHYI-HERNG;

    申请日2008-12-22

  • 分类号

  • 国家 SG

  • 入库时间 2022-08-21 18:44:27

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