首页> 外国专利> RESISTANCE CHANGE RECORDING ELEMENT, A PHASE TRANSITION RECORDING ELEMENT, A RESISTANCE CHANGE RANDOM ACCESS MEMORY, AND A PHASE TRANSITION RANDOM ACCESS MEMORY AND A INFORMATION INTERPRETATION METHOD THEREOF

RESISTANCE CHANGE RECORDING ELEMENT, A PHASE TRANSITION RECORDING ELEMENT, A RESISTANCE CHANGE RANDOM ACCESS MEMORY, AND A PHASE TRANSITION RANDOM ACCESS MEMORY AND A INFORMATION INTERPRETATION METHOD THEREOF

机译:电阻变化记录元素,相变记录元素,电阻变化随机访问存储器以及相变随机访问存储器及其信息解释方法

摘要

PURPOSE: A resistance change recording element, a phase transition recording element, a resistance change random access memory, and a phase transition random access memory and an information interpretation method thereof are provided to drive an exact element by separating a part used in recording information and reading information.;CONSTITUTION: A resistance change recording element comprises a substrate, a bit line, a resistance change layer(240), and a word line(250). A channel area is formed between a source part(211) and a drain part(212). A bit line is formed on a channel region and is made of conductive materials. A resistance change layer is formed on the bit line and is made of materials.;COPYRIGHT KIPO 2010
机译:目的:提供了一种电阻变化记录元件,相变记录元件,电阻变化随机存取存储器和相变随机存取存储器及其信息解释方法,以通过分离用于记录信息的部分来驱动精确的元件,并且组成:电阻变化记录元件包括基板,位线,电阻变化层(240)和字线(250)。在源极部分(211)和漏极部分(212)之间形成沟道区域。位线形成在沟道区上并且由导电材料制成。电阻变化层形成在位线上并由材料制成。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100005986A

    专利类型

  • 公开/公告日2010-01-18

    原文格式PDF

  • 申请/专利权人 SNU R&DB FOUNDATION;

    申请/专利号KR20080066120

  • 发明设计人 PARK TAE JOO;HWANG CHEOL SEONG;

    申请日2008-07-08

  • 分类号H01L27/115;H01L21/8247;

  • 国家 KR

  • 入库时间 2022-08-21 18:33:33

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