PATTERNING METHOD USING PATTERN OF A SELF ASSEMBLED MONOLAYER, CAPABLE OF PERFORMING A BOTTOM-UP PATTERNING IN A LARGE AREA

摘要

PURPOSE: A patterning method using pattern of a self assembled monolayer is provided to form a pattern with simple by performing dip coating, Spin coating, Casting, and spraying through a material to be pattern under a creation condition for a certain time.;CONSTITUTION: In a patterning method using pattern of a self assembled monolayer, a pattern is formed in a substrate(10) with a SAM layer(30). A pattern which is formed with the SAM layer is coated. The SAM layer has a selectivity since the SAM layer has different hydrophilic property and hydrophobicity against the material to be pattern on the substrate.;COPYRIGHT KIPO 2010