首页> 外国专利> MANUFACTURING METHOD OF A CHAOTIC MIXED MICRO CHANNEL, CAPABLE OF ADJUSTING THE GROOVE FORM OF THE LOWER END OF A CHANNEL ACCORDING TO A MASK FORM

MANUFACTURING METHOD OF A CHAOTIC MIXED MICRO CHANNEL, CAPABLE OF ADJUSTING THE GROOVE FORM OF THE LOWER END OF A CHANNEL ACCORDING TO A MASK FORM

机译:混沌混合微通道的制造方法,能够根据面罩形状调整通道下端的凹槽形状

摘要

PURPOSE: A manufacturing method of a chaotic mixed micro channel is provided to enable a channel to be easily copied several times by the manufacturing of a mask pattern through a photo sensitizer and to have a different form of groove pattern reusing a lower substrate.;CONSTITUTION: A manufacturing method of a chaotic mixed micro channel is as follows. A developing process using a channel forming photo sensitizer is performed to form a channel pattern with an inlet hole for drawing the fluid and a discharge hole for discharging the fluid(S103). A developing process using a groove forming photo sensitizer which has a property different from the channel forming photo sensitizer is performed, a groove pattern guiding chaotic mixing is formed on the channel pattern(S106). The heights of the channel pattern and the groove pattern are adjusted according the kinds of the channel forming photo sensitizer and the groove forming photo sensitizer.;COPYRIGHT KIPO 2011
机译:目的:提供一种混沌混合微通道的制造方法,该通道可通过光敏剂制造掩模图案使通道易于复制多次,并具有重复使用下部基板的不同形式的凹槽图案。 :混沌混合微通道的制造方法如下。进行使用通道形成光敏剂的显影处理以形成具有用于抽吸流体的入口孔和用于排出流体的排出孔的通道图案(S103)。进行使用具有与沟道形成型光敏剂不同的性质的凹槽形成型光敏剂的显影处理,在沟道图案上形成引导混沌混合的凹槽图案(S106)。根据形成通道的光敏剂和形成凹槽的光敏剂的种类来调节通道图案和凹槽图案的高度。; COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20100111516A

    专利类型

  • 公开/公告日2010-10-15

    原文格式PDF

  • 申请/专利权人 INHA-INDUSTRY PARTNERSHIP INSTITUTE;

    申请/专利号KR20090029979

  • 发明设计人 O BEOM HWAN;KIM BO SOON;

    申请日2009-04-07

  • 分类号B81C1/00;

  • 国家 KR

  • 入库时间 2022-08-21 18:31:43

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