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Cu doped nitride diluted magnetic semiconductor and the manufacturing method of the same

机译:铜掺杂氮化物稀释的磁性半导体及其制造方法

摘要

A Cu-doped nitride diluted magnetic semiconductor and a manufacturing method thereof are provided to easily control doping concentration of Cu by controlling an amount of an ammonia gas and a chloridation metal gas. A metal source(1), a cupric chloride(2), and a substrate(3) are arranged inside a furnace(6). The metal source is at least one among gallium, indium, and aluminum. The metal source and the cupric chloride are heated at a temperature of 600~1000‹C. An ammonia gas(4) is injected inside the furnace with a flow rate of 1~100sccm. A chloridation metal gas is generated by reaction of the metal source, Cu, and chlorine. A Cu-doped GaN is grown on the substrate by reaction of the chloridation metal gas and the ammonia gas.
机译:提供一种掺杂有铜的氮化物稀释的磁性半导体及其制造方法,以通过控制氨气和氯化金属气体的量来容易地控制铜的掺杂浓度。金属源(1),氯化铜(2)和基板(3)布置在炉(6)内部。金属源是镓,铟和铝中的至少一种。金属源和氯化铜在600〜1000℃的温度下加热。氨气(4)以1〜100sccm的流速注入炉内。金属源,铜和氯的反应会生成氯化金属气体。通过氯化金属气体和氨气的反应,在衬底上生长出掺杂Cu的GaN。

著录项

  • 公开/公告号KR100975126B1

    专利类型

  • 公开/公告日2010-08-11

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20080011318

  • 发明设计人 최헌진;성한규;김웅길;박태언;

    申请日2008-02-04

  • 分类号H01L29/82;H01L29/06;

  • 国家 KR

  • 入库时间 2022-08-21 18:30:58

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