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METHOD OF FORMATION OF EXTENDED MASSIFS nanostructures, uniform thin films and nanopowders

机译:扩展MASSIFS纳米结构,均匀薄膜和纳米粉体的形成方法

摘要

1. A process for forming extended arrays of nanostructures, homogeneous thin films and nanopowders by subjecting the sample of laser radiation through the gap between the substrate and the sample, deposition of nanoparticles on the substrate, characterized in that the selection of nanoparticles produced by varying parameters of the laser radiation. ! 2. A method according to claim 1, characterized in that a uniform layer of the nanoparticles obtained by changing the distance between the substrate and the sample. ! 3. A method according to claim 1, characterized in that the nanoparticles are prepared in an air atmosphere. ! 4. The method of claim 1, wherein the sample is a material having a nanostructured surface. ! 5. The method of claim 1, wherein the sample is a nanoporous material (mesoporous materials, nanoporous carbon). ! 6. A method according to claim 1, characterized in that the opaque substrate, for which the laser radiation is a hole. ! 7. A method according to claim 1, characterized in that the molecular layers are deposited using the same substrate.
机译:1。一种形成纳米结构,均质薄膜和纳米粉末的扩展阵列的方法,该方法通过使激光辐射样品穿过基底和样品之间的间隙,使纳米颗粒沉积在基底上,其特征在于通过改变产生的纳米颗粒的选择激光辐射的参数。 ! 2.根据权利要求1所述的方法,其特征在于,通过改变所述衬底与所述样品之间的距离而获得均匀的纳米颗粒层。 ! 3.根据权利要求1所述的方法,其特征在于,所述纳米颗粒在空气气氛中制备。 ! 4.根据权利要求1所述的方法,其中,所述样品是具有纳米结构表面的材料。 ! 5.如权利要求1所述的方法,其特征在于,所述样品是纳米孔材料(中孔材料,纳米孔碳)。 ! 6.根据权利要求1所述的方法,其特征在于,所述不透明基板的激光辐射是孔。 ! 7.根据权利要求1所述的方法,其特征在于,使用相同的基板来沉积分子层。

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