A method for operating a chemically - mechanical polishing system by means of a sensor signal of a polishing pad position ierers conditioned

摘要

A method for operating a cmp - system with:a movable and actuable polishing head (104), which is formed, a substrate (107) in position to receive and to keep;a polishing pad (102) which, on a plate (101) is mounted, which can be connected to a first drive arrangement (103) is coupled;a pad conditioning arrangement (110) which, with a second drive arrangement (112) is connected; anda control unit (120) operatively associated with the polishing head (104) and the first and second drive arrangement (103, 112) is connected, wherein the control unit (120) is formed, the operation of the first and second drive arrangement (103, 112), and wherein the controller (120) is further designed in the case of reception of a sensor signal (124) of the second drive arrangement (112) an indication of at least one property of a consumption component of the system (100) to provide,the method comprising:Conditioning of the polishing pad during the polishing of the substrate;Estimating a state of a cushion position conditioned ierers (110) on the basis of the..