首页> 外国专利> Method for manufacturing regular nano-structures on solid body surface for computers, involves bringing relief structure on solid body surface before execution of illumination, where structure exhibits dimensions within submicrometer range

Method for manufacturing regular nano-structures on solid body surface for computers, involves bringing relief structure on solid body surface before execution of illumination, where structure exhibits dimensions within submicrometer range

机译:在计算机的固态表面上制造规则的纳米结构的方法,涉及在执行照明之前将浮雕结构带到固态表面上,其中结构的尺寸在亚微米范围内

摘要

The method involves illuminating a surface of a solid body (30) with accelerated ions, and removing material from the surface of the solid body, where the solid body is made from semiconductor compound material. Illumination is executed such that a self organization process occurs on the surface of the solid body. A relief structure (34) is brought on the solid body surface, before execution of the illumination, where the relief structure exhibits dimensions within a submicrometer range. The relief structure is made of material inhomogeneous to material of the solid body.
机译:该方法包括用加速的离子照射固体(30)的表面,并从该固体的表面去除材料,其中该固体由半导体化合物材料制成。执行照明使得在固体表面上发生自组织过程。在执行照明之前,将浮雕结构(34)带到固体表面上,其中浮雕结构的尺寸在亚微米范围内。浮雕结构由与固体材料不均匀的材料制成。

著录项

  • 公开/公告号DE102009046756A1

    专利类型

  • 公开/公告日2010-05-20

    原文格式PDF

  • 申请/专利权人 AMO GMBH;RWTH AACHEN;

    申请/专利号DE20091046756

  • 发明设计人 BOBEK THOMAS;KOO NAMIL;KURZ HEINRICH;

    申请日2009-11-17

  • 分类号B82B3/00;B81B1/00;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:12

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