首页> 外国专利> METHOD FOR PRODUCING TIN-DOPED INDIUM OXIDE POWDER AND THE TIN-DOPED INDIUM OXIDE POWDER

METHOD FOR PRODUCING TIN-DOPED INDIUM OXIDE POWDER AND THE TIN-DOPED INDIUM OXIDE POWDER

机译:掺锡的氧化铟粉的生产方法及掺锡的氧化铟粉

摘要

PROBLEM TO BE SOLVED: To provide a method for producing ITO (indium tin oxide) powder the residual chlorine amount of which is made lower than the conventional product and to provide the ITO powder.;SOLUTION: The method for producing tin-doped indium oxide powder includes steps of: washing the coprecipitated hydroxide of indium and tin produced by mixing the acidic solution of indium and tin using tin chloride as a tin raw material with an alkaline solution; washing the produced coprecipitated hydroxide; drying the washed coprecipitated hydroxide; and firing the dried coprecipitated hydroxide. The method includes a step of water-washing, drying and heating the coprecipitated hydroxide, after washing the washed and dried coprecipitated hydroxide with aqueous ammonia of pH=9-12.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种制造ITO(铟锡氧化物)粉末的方法,该方法的残留氯含量低于常规产品,并提供ITO粉末。该粉末包括以下步骤:用氯化锡作为锡原料,用铟溶液混合铟和锡的酸性溶液,洗涤生成的铟和锡的共沉淀氢氧化物;洗涤产生的共沉淀氢氧化物;干燥洗涤后的共沉淀氢氧化物;并烧制干燥的共沉淀氢氧化物。该方法包括在用pH = 9-12的氨水洗涤洗涤并干燥的共沉淀氢氧化物之后,水洗,干燥和加热该共沉淀氢氧化物的步骤。版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011162375A

    专利类型

  • 公开/公告日2011-08-25

    原文格式PDF

  • 申请/专利权人 DOWA ELECTRONICS MATERIALS CO LTD;

    申请/专利号JP20100025013

  • 发明设计人 AMAGASAKI KAZUYOSHI;

    申请日2010-02-08

  • 分类号C01G15/00;C01G19/00;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:06

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