首页> 外国专利> ELECTROSTATIC ATTRACTING METHOD, EXPOSURE METHOD, ELECTROSTATIC ATTRACTING APPARATUS, ALIGNER, AND DEVICE MANUFACTURING METHOD

ELECTROSTATIC ATTRACTING METHOD, EXPOSURE METHOD, ELECTROSTATIC ATTRACTING APPARATUS, ALIGNER, AND DEVICE MANUFACTURING METHOD

机译:静电吸引方法,曝光方法,静电吸引装置,警报器和设备制造方法

摘要

PROBLEM TO BE SOLVED: To provide an electrostatic attracting method, an exposure method, an electrostatic attracting apparatus, an aligner, and a method for manufacturing device detecting information about foreign matters between an attracting object and an electrostatic chuck.;SOLUTION: The electrostatic attracting method for electrostatic attraction of an attracting object to a base board includes a detecting step 104 for detecting attracting condition of the attracting object to the base board and a determining step 105 for determining information about foreign matters between the attracting object and the base board based on the result of detection in the detecting step 104. Moreover, the electrostatic attracting apparatus for electrostatic attraction of the attracting object to the base board includes a detecting means for detecting attracting condition of the attracting object to the base board and a determining means for determining information about foreign matters between the attracting object and the base board, based on the result of detection by the detecting means.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种静电吸引方法,曝光方法,静电吸引设备,对准器以及用于制造检测关于吸引对象和静电卡盘之间的异物的信息的装置的方法。用于将吸引物静电吸引到基板的方法包括:检测步骤104,用于检测吸引物对基板的吸引条件;以及确定步骤10​​5,用于基于以下信息来确定吸引物与基板之间的异物信息:检测步骤104中的检测结果。此外,用于将吸引物静电吸引到基板的静电吸引装置包括:检测装置,用于检测吸引物向基板的吸引状况;以及确定装置,用于确定信息。关于之间的异物根据检测装置的检测结果吸引物体和基板。版权所有:(C)2011,日本特许厅&INPIT

著录项

  • 公开/公告号JP2011192814A

    专利类型

  • 公开/公告日2011-09-29

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20100057933

  • 发明设计人 OTA KAZUYA;

    申请日2010-03-15

  • 分类号H01L21/683;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 18:23:28

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