TARGET FOR ION PLATING FOR PRODUCING ZINC OXIDE-BASED TRANSPARENT CONDUCTIVE THIN FILM, AND ZINC OXIDE-BASED TRANSPARENT CONDUCTIVE THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a target for ion plating for producing a zinc oxide-based thin film having extremely low specific resistance, extremely small rate of change of the specific resistance after a wet heat resistance test, and excellent wet heat resistance, and the zinc oxide-based transparent conductive thin film produced by using the target.;SOLUTION: In the target for the ion plating for producing the zinc oxide-based transparent conductive thin film consisting of a sintered body that is made of zinc oxide containing gallium and indium, the mass ratio (In/Ga) of the gallium and indium elements is 0.01 or more and 0.6 or less, and the target has a crystalline structure of a wurtzite type single phase. In the zinc oxide-based transparent conductive thin film produced by using the target, the transparent conductive thin film has reduced zinc between lattices and zinc deficiency which are the cause of impairing the wet heat resistance and also has small absorption coefficient α to visible light so that a wavelength range where an absorption coefficient becomes minimum is shifted to 500-600 nm which is effective to visual sensitivity.;COPYRIGHT: (C)2011,JPO&INPIT