首页> 外国专利> RINSING LIQUID FOR PRODUCTION OF RELIEF PRINTING PLATE AND METHOD FOR PRODUCING RELIEF PRINTING PLATE

RINSING LIQUID FOR PRODUCTION OF RELIEF PRINTING PLATE AND METHOD FOR PRODUCING RELIEF PRINTING PLATE

机译:用于生产安心印版的冲洗液和生产安心印版的方法

摘要

PROBLEM TO BE SOLVED: To provide a rinsing liquid for producing a relief printing plate, easily removing dust produced on the printing plate during engraving, and having a small effect on the relief printing plate, and a method for producing a relief printing plate.;SOLUTION: The rinsing liquid for producing the relief printing plate containing a compound represented by a formula (1) and/or a compound represented by a formula (2), and a method for producing the same are provided. In the formula, R1 to R3 and R6 to R8 each independently represents a monovalent organic group; R4 and R9 each represents a single bond or a divalent linking group, A and B each represents PO(OR5)O-, OPO(OR5)O-, O-, COO-, or SO3-, R5 represents a hydrogen atom or a monovalent organic group; two or more groups of R1 to R3 may combine together to form a ring; and two or more groups of R6 to R8 may combine together to form a ring.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种用于制造凸版印刷版的冲洗液,该漂洗液易于去除雕刻期间在印刷版上产生的粉尘,并且对凸版印刷版的影响很小,并且提供一种浮雕版印刷版的制造方法。解决方案:提供一种用于制造凸版印刷版的漂洗液,其包含式(1)表示的化合物和/或式(2)表示的化合物,及其制造方法。式中,R 1 至R 3 和R 6 至R 8 分别独立地表示一价有机基团; R 4 和R 9 分别表示单键或二价连接基团,A和B分别表示PO(OR 5 )O-, OPO(OR 5 )O -,O -,COO -或SO 3 -,R 5 代表氢原子或一价有机基团; R 1 至R 3 的两个或多个基团可以结合在一起形成环;且两个或两个以上的R 6 至R 8 可以组合在一起形成环。版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011063013A

    专利类型

  • 公开/公告日2011-03-31

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORP;

    申请/专利号JP20100145455

  • 发明设计人 TASHIRO HIROSHI;ADACHI KEIICHI;

    申请日2010-06-25

  • 分类号B41N3/06;B41N1/12;B41C1/05;G03F7/32;G03F7/36;

  • 国家 JP

  • 入库时间 2022-08-21 18:22:20

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