首页> 外国专利> METHOD FOR DEPOSITING THIN FILM BY LASER ABLATION, TARGET FOR LASER ABLATION TO BE USED FOR THE METHOD, AND METHOD FOR PRODUCING TARGET FOR LASER ABLATION

METHOD FOR DEPOSITING THIN FILM BY LASER ABLATION, TARGET FOR LASER ABLATION TO BE USED FOR THE METHOD, AND METHOD FOR PRODUCING TARGET FOR LASER ABLATION

机译:激光烧蚀沉积薄膜的方法,该方法所用的激光烧蚀靶标以及生产激光烧蚀靶标的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for depositing a thin film by laser ablation, in which the thin film can be deposited satisfactorily efficiently while suppressing the intrusion of a droplet satisfactorily.;SOLUTION: The method for depositing the thin film by laser ablation includes the steps of: irradiating a target 1 with laser beams to produce scattering particles (a); and sticking the scattering particles (a) onto the surface of a base material 5 to deposit the thin film on the surface of the base material. The target 1 includes a supporting substrate and a particle layer which is formed on the supporting substrate and composed of particles of an inorganic material. The average particle size of the particles of the inorganic material is 5 nm to 50 μm and the thickness of the particle layer is 1-200 μm.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种通过激光烧蚀沉积薄膜的方法,其中可以令人满意地有效地沉积薄膜,同时令人满意地抑制液滴的侵入。;解决方案:通过激光烧蚀沉积薄膜的方法包括以下步骤:用激光束照射靶1以产生散射颗粒(a);将散射粒子(a)粘贴在基材5的表面上,从而在基材表面上沉积薄膜。靶1包括支撑基板和颗粒层,该颗粒层形成在支撑基板上并且由无机材料的颗粒组成。无机材料的颗粒的平均粒径为5nm至50μm,颗粒层的厚度为1-200μm。; COPYRIGHT:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011068929A

    专利类型

  • 公开/公告日2011-04-07

    原文格式PDF

  • 申请/专利权人 TOYOTA CENTRAL R&D LABS INC;

    申请/专利号JP20090219583

  • 发明设计人 AZUMA HIROZUMI;TAKECHI AKIHIRO;

    申请日2009-09-24

  • 分类号C23C14/28;

  • 国家 JP

  • 入库时间 2022-08-21 18:21:17

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号