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METHOD FOR DEPOSITING THIN FILM BY LASER ABLATION, TARGET FOR LASER ABLATION TO BE USED FOR THE METHOD, AND METHOD FOR PRODUCING TARGET FOR LASER ABLATION
METHOD FOR DEPOSITING THIN FILM BY LASER ABLATION, TARGET FOR LASER ABLATION TO BE USED FOR THE METHOD, AND METHOD FOR PRODUCING TARGET FOR LASER ABLATION
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机译:激光烧蚀沉积薄膜的方法,该方法所用的激光烧蚀靶标以及生产激光烧蚀靶标的方法
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摘要
PROBLEM TO BE SOLVED: To provide a method for depositing a thin film by laser ablation, in which the thin film can be deposited satisfactorily efficiently while suppressing the intrusion of a droplet satisfactorily.;SOLUTION: The method for depositing the thin film by laser ablation includes the steps of: irradiating a target 1 with laser beams to produce scattering particles (a); and sticking the scattering particles (a) onto the surface of a base material 5 to deposit the thin film on the surface of the base material. The target 1 includes a supporting substrate and a particle layer which is formed on the supporting substrate and composed of particles of an inorganic material. The average particle size of the particles of the inorganic material is 5 nm to 50 μm and the thickness of the particle layer is 1-200 μm.;COPYRIGHT: (C)2011,JPO&INPIT
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