首页> 外国专利> Method for producing a cured resist with a negative photosensitive resin laminate, negative photosensitive resin laminate, and using the negative photosensitive resin laminate

Method for producing a cured resist with a negative photosensitive resin laminate, negative photosensitive resin laminate, and using the negative photosensitive resin laminate

机译:具有负型感光性树脂层压体的固化抗蚀剂的制造方法,负型感光性树脂层压体以及使用该负型感光性树脂层压体的方法

摘要

Bring the resist shape and excellent resist pattern with excellent resolution and adhesion after development, manufacturing method of cured resist, negative photosensitive resin laminates, and methods of using the negative photosensitive resin laminate . Method for producing a cured resist according to the present invention is laminated to form a negative photosensitive resin laminate comprising a substrate (B) and the negative photosensitive resin layer (A) and support (C) and is stacked at least an exposure step of exposing said negative photosensitive resin layer (B) through the lens using a light is projected to the body forming step, an image of the photomask, the unexposed said negative photosensitive resin layer (B) by developing removing unit, and a developing step of forming a cured resist comprising a cured part the negative photosensitive resin layer (B), the light at a wavelength of 365nm the negative photosensitive resin layer (B) It is a method of manufacturing a cured resist transmittance is 50% or less than 25%.
机译:显影后带来具有优异的分辨率和附着力的抗蚀剂形状和优异的抗蚀剂图案,固化的抗蚀剂,负型感光性树脂层压体的制造方法以及使用该负型感光性树脂层压体的方法。层压根据本发明的固化抗蚀剂的制备方法,以形成包括基材(B)和负型感光性树脂层(A)和支撑体(C)的负型感光性树脂层压体,并至少堆叠曝光步骤。使用光通过透镜将所述负型感光性树脂层(B)投影到主体形成步骤,光掩模的图像,通过显影去除单元未曝光的所述负型感光性树脂层(B)以及形成显影剂的显影步骤。固化型抗蚀剂,其特征在于,其特征在于,其包括:固化性抗蚀剂的透射率为50%以下且小于25%的方法,该固化性抗蚀剂为负型感光性树脂层(B),波长为365nm的光,负型感光性树脂层(B)。

著录项

  • 公开/公告号JPWO2009078380A1

    专利类型

  • 公开/公告日2011-04-28

    原文格式PDF

  • 申请/专利权人 旭化成イーマテリアルズ株式会社;

    申请/专利号JP20090546256

  • 发明设计人 井出 陽一郎;

    申请日2008-12-15

  • 分类号G03F7/004;G03F7/027;G03F7/031;G03F7/11;G03F7/40;H05K3/06;H05K3/18;

  • 国家 JP

  • 入库时间 2022-08-21 18:16:53

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号