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Method for producing a cured resist with a negative photosensitive resin laminate, negative photosensitive resin laminate, and using the negative photosensitive resin laminate
Method for producing a cured resist with a negative photosensitive resin laminate, negative photosensitive resin laminate, and using the negative photosensitive resin laminate
Bring the resist shape and excellent resist pattern with excellent resolution and adhesion after development, manufacturing method of cured resist, negative photosensitive resin laminates, and methods of using the negative photosensitive resin laminate . Method for producing a cured resist according to the present invention is laminated to form a negative photosensitive resin laminate comprising a substrate (B) and the negative photosensitive resin layer (A) and support (C) and is stacked at least an exposure step of exposing said negative photosensitive resin layer (B) through the lens using a light is projected to the body forming step, an image of the photomask, the unexposed said negative photosensitive resin layer (B) by developing removing unit, and a developing step of forming a cured resist comprising a cured part the negative photosensitive resin layer (B), the light at a wavelength of 365nm the negative photosensitive resin layer (B) It is a method of manufacturing a cured resist transmittance is 50% or less than 25%.
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