首页> 外国专利> POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM

POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM

机译:正型辐射敏感组合物,固化膜,夹层绝缘膜,形成夹层绝缘膜的方法,显示装置以及用于形成夹层绝缘膜的硅氧烷聚合物

摘要

The present invention provides a positive-type radiation-sensitive composition containing (A) a siloxane polymer, and (B) a quinone diazide compound, in which the content of aryl groups relative to Si atoms in the siloxane polymer (A) is greater than 60% by mole and no greater than 95% by mole.;
机译:本发明提供一种正型放射线敏感性组合物,其包含(A)硅氧烷聚合物和(B)醌二叠氮化物,其中硅氧烷聚合物(A)中相对于Si原子的芳基含量大于1。 60摩尔%至95摩尔%。

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