首页> 外国专利> METHOD FOR PRODUCING SEMICONDUCTOR LIGHT-EMITTING ELEMENT, SEMICONDUCTOR LIGHT-EMITTING ELEMENT, AND PHOTOSENSITIVE COMPOSITION USED FOR SAID METHOD FOR PRODUCING SEMICONDUCTOR LIGHT-EMITTING ELEMENT

METHOD FOR PRODUCING SEMICONDUCTOR LIGHT-EMITTING ELEMENT, SEMICONDUCTOR LIGHT-EMITTING ELEMENT, AND PHOTOSENSITIVE COMPOSITION USED FOR SAID METHOD FOR PRODUCING SEMICONDUCTOR LIGHT-EMITTING ELEMENT

机译:用于制造半导体发光元件的方法的制造半导体发光元件的方法,半导体发光元件以及光敏组合物

摘要

Provided is a method for producing a semiconductor light-emitting element having a current blocking layer, wherein it is possible to form a current blocking layer of various shapes on various positions on the layer without involving an etching process. Also provided are a semiconductor light-emitting element obtained by means of said method for producing a semiconductor light-emitting element, and a photosensitive composition used in said method for producing a semiconductor light-emitting element. The method for producing a semiconductor light-emitting element having a current blocking layer involves forming a pattern which can be obtained from the photosensitive composition by means of the lithography method, and is characterized in that said pattern becomes the current blocking layer.
机译:提供一种用于制造具有电流阻挡层的半导体发光元件的方法,其中可以在层上的各个位置上形成各种形状的电流阻挡层而无需进行蚀刻工艺。还提供了通过所述用于制造半导体发光元件的方法获得的半导体发光元件,以及在所述用于制造半导体发光元件的方法中使用的光敏组合物。具有电流阻挡层的半导体发光元件的制造方法包括形成可以通过光刻法从感光性组合物得到的图案的特征,该图案成为电流阻挡层。

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