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Device of washing using pulse zet type cleanning solution supply
Device of washing using pulse zet type cleanning solution supply
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机译:使用脉冲喷射式清洗液供给的清洗装置
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摘要
A cleaning device for supplying the cleaning liquid supplied to the substrate or the type of pressure applied to the cleaning liquid to a pulse type that repeats supplying and stopping for a predetermined time, and the supplying cleaning liquid is set at a high pressure of about 20 kg / cm 2 . Is disclosed.;According to the present invention, the water film is formed on the substrate surface during the cleaning process to eliminate the problem of lowering the cleaning efficiency, thereby improving the cleaning efficiency and saving the cleaning liquid.
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机译:清洁装置,用于将供给至基板的清洁液或施加至清洁液的压力的类型供给为在预定时间重复供给和停止的脉冲型,并且供给清洁液的压力设定为约20的高压。 kg / cm 2 Sup>。根据本发明,在清洁过程中在基板表面上形成水膜,以消除降低清洁效率的问题,从而提高清洁效率并节省清洁液。
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