首页> 外国专利> CARBON BLACK SAMPLING FOR PARTICLE SURFACE AREA MEASUREMENT USING LASER-INDUCED INCANDESCENCE AND REACTOR PROCESS CONTROL BASED THEREON

CARBON BLACK SAMPLING FOR PARTICLE SURFACE AREA MEASUREMENT USING LASER-INDUCED INCANDESCENCE AND REACTOR PROCESS CONTROL BASED THEREON

机译:基于激光诱导的光度和反应器过程控制的炭黑采样用于表面面积测量

摘要

In the present invention, there is provided an in-situ method of measuring the in-situ sampling and fine particles (for example carbon black) fineness in the process stream such as in a carbon black reactor, the method for in-situ sampling (a) particles from the process stream step, (b) adjusting the sample to conditions suitable for LII, (c) measuring the fineness using LII, and (d) includes the step of correlating the measured actual particle fineness help LII fine do. Particle-in-situ sampling containing stream and the laser method of measuring the fineness particles using induced incandescence method (LII) (a) a step of in-situ sampling a particle, (b) adjusting the sample to conditions suitable for LII that step, (c) measuring the adjusted sample using LII, and (d) of the actual particle fineness help LII fineness including the step of correlating the measured value. The invention also includes a sampling and process control methods based on real-time, on-line, in-situ method for sampling and measuring particles. Sampling may include a side stream emanating from a source of particles. Adjusting the sample to conditions suitable for LII can comprise the changing of the temperature of the sample or to dilute the sample to ambient conditions. Correlating may include using a correlation function determined by comparing the laboratory fineness measurements for particle samples leaked LII measurements and at the same time.
机译:在本发明中,提供了一种原位测量方法,该方法用于测量诸如炭黑反应器等工艺流中的原位采样和细颗粒(例如炭黑)的细度。 a)来自工艺流程步骤的颗粒,(b)将样品调整至适合LII的条件,(c)使用LII测量细度,并且(d)包括将测得的实际颗粒细度与LII细度相关的步骤。包含流的粒子原位采样以及使用感应白炽灯法(LII)的激光测量细度粒子的方法(a)原位采样粒子的步骤,(b)将样本调整为适合该LII的条件,(c)使用LII测量调整后的样品,以及(d)实际颗粒细度有助于LII细度,包括将测量值关联起来的步骤。本发明还包括基于用于采样和测量颗粒的实时,在线,原位方法的采样和过程控制方法。采样可以包括从颗粒源发出的侧流。将样品调节至适合LII的条件可以包括改变样品的温度或将样品稀释至环境条件。关联可以包括使用通过对同时泄漏的LII测量值进行比较的实验室细度测量结果进行比较而确定的相关函数。

著录项

  • 公开/公告号KR100996304B1

    专利类型

  • 公开/公告日2010-11-23

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20057001036

  • 发明设计人 스택배리제임스;

    申请日2003-07-18

  • 分类号G01N21/71;G01N15/02;G01N1/22;

  • 国家 KR

  • 入库时间 2022-08-21 17:52:56

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号