METHOD FOR MANUFACTURING SLURRY FOR CHEMICAL MECHANICAL POLISHING CAPABLE OF MINIMIZING MICRO SCRATCH AND THE SLURRY FOR CHEMICAL MECHANICAL POLISHING PREPARED USING THE SAME

摘要

PURPOSE: A method for manufacturing slurry for chemical mechanical polishing is provided to quantitively measure the number and content of macroparticles present in the slurry for chemical mechanical polishing and to prepare slurry capable of minimizing micro scratch.;CONSTITUTION: A method for manufacturing slurry for chemical mechanical polishing includes the steps of: (S100) mixing abrasive particles, ultrapure water and dispersing agent to prepare a mixture for preparing slurry; (S110) milling the mixture for preparing slurry; (S120) filtering the mixture using a filter; and (S130) measuring the content of abrasive particles with 150% or more of particle diameter based on the abrasive particle diameter.;COPYRIGHT KIPO 2011