首页> 外国专利> MLA CONTAING FIDUCIAL MARK AND MASKLESS EXPOSURE APPARATUS WITH AFOREMENTIONED MLA AND CALIBRATING METHOD THEREOF

MLA CONTAING FIDUCIAL MARK AND MASKLESS EXPOSURE APPARATUS WITH AFOREMENTIONED MLA AND CALIBRATING METHOD THEREOF

机译:带有MLA的带有MLA的假冒商标和无接触暴露装置及其校准方法

摘要

PURPOSE: A micro-lens array including a reference mark and an exposure apparatus without a mask and a correcting method of the same are provided to easily measure and correct the axis twisting of the micro-lens array(MLA) and a digital micro device(DMD) of an exposure apparatus without a mask using the MLA including a reference mark. CONSTITUTION: A reference mark(20a) is formed instead of a micro-lens in a part of a micro-lens array(20) corresponding to a pixel of a space optical modulator device. A deformed beam in the space optical modulator device of an exposure apparatus without a mask is passing through the micro-lens array. The space optical modulator device deforms a generated beam from a light source into a desired pattern. A plurality of micro-lens compresses the deformed beam in the space optical modulator device.
机译:用途:提供一种包括参考标记的微透镜阵列和不带掩模的曝光设备及其校正方法,以轻松地测量和校正微透镜阵列(MLA)和数字微设备的轴扭曲使用包括参考标记的MLA的不带掩模的曝光设备的DMD)。构成:在与空间光学调制器器件的像素相对应的微透镜阵列(20)的一部分中,代替微透镜形成了参考标记(20a)。没有掩模的曝光设备的空间光学调制器装置中的变形光束穿过微透镜阵列。空间光学调制器装置将来自光源的产生的光束变形为期望的图案。多个微透镜压缩空间光学调制器装置中的变形光束。

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