Apparatus for rapid thermal annealing and method of activating impurities using the same

摘要

The present invention relates to a rapid heat treatment device , more specifically to the substrate during the manufacturing process of the liquid crystal display device relates to a lamp in rapid heat treatment apparatus in the heat treatment process that allows to maximize the effectiveness of the implanted ion activation , the light energy emitted by the lamp to further agglomerated with a lens bar , which can be irradiated onto the substrate so that the lens the light irradiation area can be adjusted according to the desired range by , as well as the advantage is easy to control the degree of activation .