Optical element for filtering electromagnetic radiations for illuminating system of projection exposure system, has multilayer structure, which is designed for reflection of electromagnetic radiations in extreme ultraviolet wavelength range

摘要

The optical element has a multilayer structure, which is designed for the reflection of electromagnetic radiations in the extreme ultraviolet wavelength range. The optical element has a lattice structure (13), which is designed for deflecting electromagnetic radiations in the visible to infrared wavelength range. An independent claim is also included for a projection exposure system with a field facet mirror.