首页> 外国专利> Semiconductor device e.g. trench type MOSFET has source metal contact that is deposited above to form electrical contact with electrically conductive layers positioned in peripheral region of semiconductor substrate

Semiconductor device e.g. trench type MOSFET has source metal contact that is deposited above to form electrical contact with electrically conductive layers positioned in peripheral region of semiconductor substrate

机译:半导体器件沟槽型MOSFET具有源极金属触点,该金属触点沉积在上方,从而与位于半导体衬底外围区域的导电层形成电接触

摘要

The device (50) has a semiconductor substrate (51) having major surface (52), active area (53) and peripheral region (54) positioned adjacent to active area, where active area has trenches (55) filled with oxides, and electrode (56) positioned in one trench. One dielectric layer (57) is positioned on major surface. Electrically conductive layers are positioned in peripheral region, spatially isolated from one another and extending through dielectric layer. A source metal contact (58) is deposited above to form an electrical contact with electrically conductive layers.
机译:器件(50)具有半导体衬底(51),该半导体衬底具有主表面(52),有源区域(53)和与有源区域相邻放置的外围区域(54),其中有源区域具有填充有氧化物的沟槽(55)和电极。 (56)位于一个沟槽中。一个介电层(57)位于主表面上。导电层位于外围区域中,在空间上彼此隔离并且延伸穿过介电层。源极金属触点(58)沉积在上方以形成与导电层的电触点。

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