RESIN FOR ETCHING MASK, COATING MATERIAL FOR ETCHING MASK AND METHOD FOR FORMING PATTERN ON SAPPHIRE SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a resin for etching mask, providing a coated film having excellent etching resistance and adhesiveness to a sapphire substrate; to provide a coating material for the etching mask, containing the resin for the etching mask; and to provide a method for forming a pattern on the sapphire substrate by using the coating material for the etching mask.;SOLUTION: The resin for the etching mask is a resin for the etching mask usable for the formation of the etching mask arranged on the surface of the sapphire substrate, is the resin (a ring-opened (co)polymer of a cyclic olefin) having a polar group (a polar group having an oxygen atom) and ≤3 of a value calculated by the formula (1): N_T/(N_C-N_O) (1) (wherein, N_T is the number of the whole atoms constituting the resin; N_C is the total number of the carbon atoms constituting the resin; and N_O is the total number of the oxygen atoms constituting the resin).;COPYRIGHT: (C)2012,JPO&INPIT