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The plated device, the storage body which has plated manner and the storage space which

机译:电镀装置,具有电镀方式的收纳体以及收纳空间

摘要

PROBLEM TO BE SOLVED: To provide plating equipment and a plating method which provide a plating film with high-quality and uniform film thickness, have improved plating efficiency, and achieve energy saving, and to provide a method for manufacturing a chip type electronic component.;SOLUTION: The plating equipment has: a carrier plate 22 having a storage section 24 to store an element body 10; a conveyor belt 30 which moves together with the carrier plate 22; a plating solution impregnating roller 40 which supplies a plating solution to the storage section 24 during movement of the carrier plate 22; and an anode electrode and a cathode electrode indirectly or directly connected with portions planned to be plated of the element body 10 in a state in which the plating solution is supplied to the storage section 24.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种电镀设备和电镀方法,该电镀设备和电镀方法可以提供高质量且均匀的膜厚的镀膜,并具有提高的镀覆效率并实现节能的目的,并且提供一种用于制造芯片型电子元件的方法。 ;解决方案:镀覆设备具有:承载板22,其具有用于存储元件主体10的存储部分24;传送带30,其与承载板22一起移动;镀液浸渍辊40,其在承载板22的移动过程中将镀液供应至存储部24;阳极电极和阴极电极在将镀液供给至存储部24的状态下与元件主体10的计划镀敷的部分间接或直接连接。版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP5056888B2

    专利类型

  • 公开/公告日2012-10-24

    原文格式PDF

  • 申请/专利权人 TDK株式会社;

    申请/专利号JP20100075949

  • 发明设计人 渡辺 秀利;坂野 哲史;

    申请日2010-03-29

  • 分类号C25D17/16;C25D17/08;C25D7/00;

  • 国家 JP

  • 入库时间 2022-08-21 17:40:53

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