APPLICATION OF BENZOCYCLOBUTENE RESIN TO IMPRINT TECHNOLOGY, AND METHOD FOR FORMING PATTERN BY THE TECHNOLOGY

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a pattern of a benzocyclobutene resin using a thermal imprint lithography technology.;SOLUTION: The method includes a process of forming a layer containing the benzocyclobutene resin obtained by polymerizing divinyl siloxane-bisbenzocyclobutene represented by a formula (2) on a base plate, a process of pressing a mold to the benzocyclobutene resin-containing layer while heating and pressing the mold to form the pattern on the benzocyclobutene-containing layer, and a process of removing the benzocyclobutene-containing layer on which the pattern is formed from the mold after cooling wherein the heating temperature is 150 to 350°C.;COPYRIGHT: (C)2012,JPO&INPIT