The solution null next general expression of precursive

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a porous film having low permittivity, low refractive index, and high mechanical strength, and which is improved in hydrophobicity without corroding a film-forming chamber, its member, an exhaust system, piping and the like; a porous film; and a solution of a precursor composition of a porous film.;SOLUTION: This solution of a precursor composition of a porous film contains: a compound selected from compounds represented by formulas Si(OR¹)₄ and R_a(Si)(OR²)_4-a, where R¹ is a univalent organic group, R is a hydrogen atom, fluorine atom or univalent organic group, R² is a univalent organic group, (a) is an integer of 1-3, and R, R¹ and R² may be identical or different to/from one another; and a thermally-degradable organic compound. The solution with a pH value of 5-9 is applied to a surface of a substrate, and the substrate is baked in a predetermined temperature range, the obtained porous film is irradiated with ultraviolet ray; and thereafter, a hydrophobic compound selected from hexamethyldisilazane, bis(trimethylsilyl)acetamide, trimethylsilylimidazol and trimethylamine dimethylamine is subjected to vapor-phase reaction at a predetermined temperature, whereby the hydrophobized porous film is manufactured.;COPYRIGHT: (C)2010,JPO&INPIT