首页>
外国专利>
Soluble and bottom anti-reflective coating to the developer in the double layer of light-sensitive for 193nm lithography
Soluble and bottom anti-reflective coating to the developer in the double layer of light-sensitive for 193nm lithography
展开▼
机译:193nm光刻的双层感光层中的显影剂的可溶性和底部抗反射涂层
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention provides methods of fabricating microelectronics structures and the resulting structures formed thereby using a dual-layer, light-sensitive, wet-developable bottom anti-reflective coating stack to reduce reflectance from the substrate during exposure. The invention provides dye-filled and dye-attached compositions for use in the anti-reflective coatings. The anti-reflective coatings are thermally crosslinkable and photochemically decrosslinkable. The bottom anti-reflective coating stack has gradient optical properties and develops at the same time as the photoresist. The method and structure are particularly suited to high-NA lithography processes.
展开▼