High-frequency electromagnetic field supply method for minimizing the plasma instabilities in the high-frequency processor, the memory used in the device and the high frequency electromagnetic field supply unit

摘要

(57) to provide a new and improved method and apparatus to allow achieving a uniform predictable workpiece characteristics by controlling [Abstract] the plasma of the present invention relates a vacuum plasma processor. And changing the variable reactance of the matching network connected between a plasma load of the vacuum plasma chamber for processing a workpiece SOLUTION: A high-frequency power source, while close to the matching, it may adversely affect the processing of the workpieces I want to avoid a tendency to change the instability of the plasma. Tends to vary the unstable plasma is detected by monitoring the electrical parameters resulting from the high-frequency current flowing between the power supply and the load through the network. Parameter may be an amplitude modulation of one or both of the range of 50~200kHz and (2) 2~20kHz based on (1) the statistical variance or example, the percentage of power supply.