首页>
外国专利>
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND METHOD OF IMPROVING A MATHEMATICAL MODEL OF A LITHOGRAPHIC PROCESS.
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND METHOD OF IMPROVING A MATHEMATICAL MODEL OF A LITHOGRAPHIC PROCESS.
展开▼
机译:控制光刻设备的方法,设备制造方法,光刻设备,计算机程序产品以及改进光刻过程的数学模型的方法。
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.
展开▼