首页> 外国专利> HALF AND THROUGH-ETCHING MANUFACTURING METHOD OF A DOOR SCUFF AND THE HALF OF A DOOR STEP CAPABLE OF MAKING A THROUGH-PATTERN INCLUDING THE EMBOSSMENT AND INTAGLIO PATTERN IN A DOOR SCUFF AND A DOOR STEP THROUGH AN ETCHING PROCESS

HALF AND THROUGH-ETCHING MANUFACTURING METHOD OF A DOOR SCUFF AND THE HALF OF A DOOR STEP CAPABLE OF MAKING A THROUGH-PATTERN INCLUDING THE EMBOSSMENT AND INTAGLIO PATTERN IN A DOOR SCUFF AND A DOOR STEP THROUGH AN ETCHING PROCESS

机译:门板的半透加工方法以及能够通过包括在门板中的压纹和凹版图案在内的整个门图案的整个门台阶的一半,以及通过蚀刻过程的门台阶

摘要

PURPOSE: A half and through-etching manufacturing method of a door scuff and the half of a door step is provided to make a small gap less than 1mm by forming through-pattern through an etching process.;CONSTITUTION: A half and through-etching manufacturing method of a door scuff and the half of a door step comprises the following steps. The foreign material of a prepared plate(50) is removed(S1,S2). The films(70,80) having a through-pattern(75) is attached to a dry film(60) attached to the surface and rear side of the plate(S3,S4). The ultraviolet ray is firstly exposed to the plate(S5). A part of the plate where the dry film is removed is firstly corroded to the etching solution. The hardened dry film of the plate is removed. The film having an embossment pattern and an intaglio pattern is attached to the surface and rear side of the plate. The ultraviolet ray is secondly exposed to the plate. A part of the plate in which the dry film is removed is corroded. In order that the firstly corroded part is penetrated, it is corroded. The rim of the door side and door step is punched to the mold and is separated from the plate.;COPYRIGHT KIPO 2012
机译:目的:通过刻蚀工艺形成贯穿图案,形成门sc口和门台阶的一半的半蚀刻加工方法,以使间隙小于1mm。构成:半蚀刻和半蚀刻门sc和门的一半的制造方法的步骤包括以下步骤。除去准备好的板(50)的异物(S1,S2)。具有贯通图案(75)的膜(70,80)被附着在干燥膜(60)上,该干膜被附着在板(S3,S4)的表面和背面。首先将紫外线暴露于板(S5)。首先将去除干膜的板的一部分腐蚀到蚀刻溶液中。去除板的硬化干膜。具有压花图案和凹版图案的膜被附着到板的表面和背面。其次,紫外线暴露于板。除去干膜的板的一部分被腐蚀。为了使首先被腐蚀的部分被穿透,它被腐蚀了。门侧和门台阶的边缘被冲压到模具上并与板分离。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR101098344B1

    专利类型

  • 公开/公告日2011-12-26

    原文格式PDF

  • 申请/专利权人 DME CO. LTD.;

    申请/专利号KR20110061257

  • 发明设计人 AN MYUNG HYUN;

    申请日2011-06-23

  • 分类号B60R13/02;B60J5/04;B60R3/00;

  • 国家 KR

  • 入库时间 2022-08-21 17:10:54

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