SUSCEPTOR FOR CHEMICAL VAPOR DEPOSITION CAPABLE OF PREVENTING A SUBSTRATE FOR SEMICONDUCTOR GROWTH FROM BEING UNEVENLY HEATED, A CHEMICAL VAPOR DEPOSITION APPARATUS, AND A HEATING METHOD USING THE CHEMICAL VAPOR DEPOSITION APPARATUS

摘要

PURPOSE: A susceptor for chemical vapor deposition, a chemical vapor deposition apparatus, and a heating method using the chemical vapor deposition apparatus are provided to grow good quality semiconductor on a substrate by uniformly heating a substrate even if the substrate is bent.;CONSTITUTION: A susceptor(100) includes a susceptor body part(104) and a light absorption part(107). The susceptor body part is made of a light transmitting material. The light absorption part is formed on an upper side of the susceptor body part. A first light absorption layer(102) is formed on a lower side of a substrate(101). The first light absorption layer absorbs light passing through the susceptor body part.;COPYRIGHT KIPO 2012