MANUFACTURING METHOD OF X-RAY/GAMMA-RAY(amp;gamma;-RAY) FOCUSING OPTICAL SYSTEM USING ATOMIC LAYER DEPOSITION CAPABLE OF MANUFACTURING THE STRUCTURE HAVING THE OUTERMOST LAYER WITH HIGH ASPECT RATIO

摘要

PURPOSE: A manufacturing method of a X-ray/gamma-ray(γ-ray) focusing optical system using atomic layer deposition is provided to have high definition and high aspect ratio by adjusting the thickness of the outermost layer of a multilayer thin film structure as an atomic unit.;CONSTITUTION: A capillary tube substrate is provided(ST51). An X-ray/gamma-ray opaque material is successively deposited by atomic layer deposition on the inner surface of the capillary tube(ST52). An X-ray/gamma-ray transparent material is successively deposited by atomic layer deposition on the inner surface of the capillary tube(ST53). A multilayer thin film structure is formed in the capillary tube by alternatively depositing the X-ray/gamma-ray opaque material and the X-ray/gamma-ray transparent material(ST54).;COPYRIGHT KIPO 2012