SHEET RESISTANCE MEASUREMENT APPARATUS OF THIN FILM MATERIALS USING THE VAN DER PAUW METHOD

摘要

PURPOSE: A conductive thin film surface resistance measuring apparatus which uses a Van der Pauw method and a method thereof are provided to precisely measure the surface resistance of the thin film by a probe station apparatus. CONSTITUTION: A probe station mounts a surface resistance measurement specimen(1). Four points of the measurement specimen is connected to a probe in order to apply a Van der Pauw method. A current source(20) is connected to a current supply terminal of the probe station. The current source supplies current to the measurement specimen through the probe station. An A/D converter(30) is connected to a voltage measurement terminal of the probe station and amplifies measured voltage in the voltage measurement terminal. A CPU(40) controls current supply of the current source and computes surface resistance based on the resistance in a horizontal axis direction and vertical axis direction.