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The parent hydration treatment backing material, production manner null of the parent hydration treatment powder body, and the parent hydration treatment powder body

机译:母体水合处理粉体的制造方法,母体水合处理粉体的制造方式无效。

摘要

PPROBLEM TO BE SOLVED: To provide a hydrophilized substrate having sufficient hydrophilicity, to provide a hydrophilized powder not causing skin irritation or the like, and to provide a dispersion of the hydrophilized powder. PSOLUTION: The hydrophilized substrate is obtained by treating the surface of a substrate with a hydrolyzable silyl group-containing acid anhydride silane compound represented by general formula (1) (wherein, RSP1/SPis a hydrogen atom or 1C-6C alkyl group; RSP2/SPs are the same or different organic groups selected from 1C-30C alkyl group, aryl group, aralkyl group and fluorine-substituted alkyl group; A is a linear or branched 2C-6C alkylene group; a is an integer of 1-3; b is an integer of 0-2; and a+b=3), then ring-opening the acid anhydride portion by hydrolysis, and further partially or completely neutralizing the resulting compound with an alkali. PCOPYRIGHT: (C)2010,JPO&INPIT
机译:<解决的问题:提供具有足够亲水性的亲水化基材,提供不引起皮肤刺激等的亲水化粉末,并提供亲水化粉末的分散体。

解决方案:通过用通式(1)表示的可水解的含甲硅烷基的酸酐硅烷化合物处理衬底的表面来获得亲水化的衬底,其中R 1 是氢原子或1C-6C烷基; R 2 是选自1C-30C烷基,芳基,芳烷基和氟取代的烷基的相同或不同的有机基团; A为直链或2C-6C亚烷基; a是1-3的整数; b是0-2的整数;和a + b = 3),然后通过水解将酸酐部分开环,并进一步部分或完全中和得到的化合物与碱。

版权:(C)2010,日本特许厅&INPIT

著录项

  • 公开/公告号JP5206970B2

    专利类型

  • 公开/公告日2013-06-12

    原文格式PDF

  • 申请/专利权人 信越化学工業株式会社;

    申请/专利号JP20090003440

  • 发明设计人 雨宮 正博;

    申请日2009-01-09

  • 分类号C01G9/02;C01G23/047;

  • 国家 JP

  • 入库时间 2022-08-21 17:00:31

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