Pattern evaluation system evaluation target pattern determining device, evaluation target pattern determining method, and the evaluation target pattern determining program

摘要

PROBLEM TO BE SOLVED: To provide a device for determining a pattern to be evaluated, which can determine a partial pattern to be evaluated within a range not causing omission.;SOLUTION: The device is for use in a pattern evaluating system storing patterns of a LSI chip as CAD data, picking out coordinates of local patterns whose process margin is small from the CAD data by way of simulation and assisting observation of the local patterns produced in a fabrication line. The device includes a risk level map creating section 204 for creating risk level maps in which risk areas are disposed. The risk area is assigned with a risk level obtained by digitizing that the risk area is an area whose process margin is smaller than other areas. The device further includes a superimposition processing section 207 for superimposing the coordinates of the local patterns with the risk level map to pick out the coordinates of the local patterns located within the risk area.;COPYRIGHT: (C)2009,JPO&INPIT