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Process for the destruction of toxic residues via oxidation in presence of water and oxygen and continuous mobile unit to treat hazardous compounds
Process for the destruction of toxic residues via oxidation in presence of water and oxygen and continuous mobile unit to treat hazardous compounds
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机译:在水和氧气存在下通过氧化消除有毒残留物的方法以及连续移动单元以处理有害化合物
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摘要
Process for the destruction of toxic residues via oxidation in the presence of water and oxygen developed in homogenous phase at temperatures over 374° C. and pressure of at least 220 atmospheres and a continuous mobile unit easily transferred to treat effluents or contaminated media. This mobile unit is composed of a reactor, which includes pressurization, reaction, cooling, depressurization and sampling zones for the destruction of toxic residues like polychloride biphenyls (PCBs), pyridines, and other hazardous compounds.
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