首页> 外国专利> Refractive index distribution measuring method and apparatus, and method of producing optical element thereof, that use multiple transmission wavefronts of a test object immersed in at least one medium having a different refractive index from that of the test object and multiple reference transmission wavefronts of a reference object having known shape and refractive index distribution

Refractive index distribution measuring method and apparatus, and method of producing optical element thereof, that use multiple transmission wavefronts of a test object immersed in at least one medium having a different refractive index from that of the test object and multiple reference transmission wavefronts of a reference object having known shape and refractive index distribution

机译:折射率分布测量方法,装置及其光学元件的制造方法,使用浸没在至少一种折射率与测试对象的折射率不同的介质中的测试对象的多个透射波前和参考的多个参考透射波前具有已知形状和折射率分布的物体

摘要

The method measures first transmitted wavefronts and second transmitted wavefronts by respectively causing reference light to enter an object placed in plural placement states in a first medium and a second medium, calculates an aberration sensitivity with respect to changes of the placement state of the object, and calculates an alignment error of the object in each placement state by using the aberration sensitivity and the first and second transmitted wavefronts measured in each placement state. The method further calculates first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium, and calculates a refractive index distribution of the object which a shape component thereof is removed, by using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts.
机译:该方法通过分别使参考光进入在第一介质和第二介质中以多个放置状态放置的物体来测量第一透射波阵面和第二透射波阵面,计算关于该物体的放置状态的变化的像差灵敏度,以及通过使用像差灵敏度以及在每个放置状态下测量的第一和第二透射波前,计算在每个放置状态下物体的对准误差。该方法还计算当使参考光进入放置在包括第一介质和第二介质中的对准误差的放置状态下的参考物体时分别可获取的第一参考透射波前和第二参考透射波前,并计算该物体的折射率分布。通过使用第一和第二透射波前以及第一和第二参考透射波前去除其形状分量。

著录项

  • 公开/公告号US8477297B2

    专利类型

  • 公开/公告日2013-07-02

    原文格式PDF

  • 申请/专利权人 SEIMA KATO;

    申请/专利号US201113305827

  • 发明设计人 SEIMA KATO;

    申请日2011-11-29

  • 分类号G01N21/41;

  • 国家 US

  • 入库时间 2022-08-21 16:44:46

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